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OEF9120 SSD 0.9 WQXGA
 
   
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OEF9120 SSD 0.9 WQXGA

Super large capacity digital micromirror spatial light modulator

  • Product Code:OEF9120 SSD 0.9 WQXGA
  • Item:OEF9120 SSD 0.9 WQXGA
  • Brand:OELABS

     The ultra large capacity digital micromirror spatial light modulator is designed using Xilinx high-performance 

FPGA and multiple parallel solid-state hard disks. It can store massive image data and maximize the advantages 

of DMD's fast flipping speed, which can meet the application requirements in fields such as maskless lithography,

LDI, computer direct imaging, computational imaging, digital lithography, and high-resolution microscopy. The ultra

large capacity digital micromirror spatial light modulator uses TI advanced optical control chips, designed for industrial

and scientific research fields, supporting accurate internal and external synchronization signals, and being able to 

closely cooperate with cameras, motion platforms, etc.

Product Details

Chipset

DLPC910+DLP9000X

DMD Type

DLP9000X

DMD Diagonal Dimension

0.9 inch

DMD Physical Resolution

2560*1600

DMD Micromirror Size

7.56um

Maximum Frame Rate (Binary)

11000Hz

Maximum Frame Rate (8-Bit Grayscale

522.19Hz

Maximum Frame Rate (16 Bit Grayscale)

3Hz

Number Of Stored Pictures

2.5TB231 10000 sheets(Binary)

5TB915 10000 Sheets(Binary)

10TB1952 10000 Sheets(Binary)

Band Range

VIS:400nm-700nm
UV:355nm-420nm

PC Joggle

Gigabit or 10 Gigabit Ethernet or USB 3.0

Length Of Flexible Cable

31CM

Transition Angle

±12°

DMD Installation Method

0°or 45°

Gray Scale

1-16bit grayscale level can be set, and frame rate can

be set

Software Support

C++matlabLabviewPython

On-Board Memory

Two 5.0V output triggers and two 5.0V input triggers 

allow multiple solid-state drives to operate in parallel, 

with multiple capacities of 1TB, 2TB, 3TB, 4TB, 8TB, 

10TB, 12TB, and more

Trigger Interface

Two 5.0V output triggers and two 5.0V input triggers

Application Area

Digital imaging lithography, laser marking, computer 

direct plate making printers, light field modulation, 

maskless lithography, computational imaging, LDI, 

super resolution microscopy, etc

 

 

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